Effect of substrate temperature on the deposition of polytetrafluoroethylene by an ionization-assisted evaporation method

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 13, Issue 5, 1995, Pages 2318-2324

  Usui, H ^a   Koshikawa, H ^a   Tanaka, K ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21844517460     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.579515     Document Type: Article

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