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Volumn 54, Issue 1-3, 1998, Pages 131-134
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Preparation of electrical insulating films for high temperature devices by ion beam assisted plasma CVD
a
a
IHI CORPORATION
(Japan)
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Author keywords
Aluminum oxide; Electrical resistance; Ion beam assisted plasma CVD; Thin film sensor; X ray diffraction
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Indexed keywords
ALUMINA;
CRYSTAL ORIENTATION;
CRYSTAL STRUCTURE;
ELECTRIC CONDUCTIVITY MEASUREMENT;
ELECTRIC INSULATING MATERIALS;
FILM PREPARATION;
ION BEAMS;
NICKEL ALLOYS;
PLASMAS;
SUBSTRATES;
THIN FILMS;
X RAY CRYSTALLOGRAPHY;
ALUMINUM OXIDE FILM;
ELECTRIC INSULATING FILM;
THIN FILM SENSOR;
CHEMICAL VAPOR DEPOSITION;
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EID: 0032118060
PISSN: 02540584
EISSN: None
Source Type: Journal
DOI: 10.1016/S0254-0584(98)00022-4 Document Type: Article |
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Times cited : (8)
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References (4)
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