Preparation of Al2O3 films by a new CVD process combining plasma and accelerated ion beams

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 112, Issue 1-4, 1996, Pages 280-283

  Nakai, Hiroshi ^a   Kuwahara, Hajime ^a   Shinohara, Joji ^a   Kawaratani, Tatsumi ^a   Sassa, Tadashi ^a   Ikegami, Yuji ^a  

^a IHI CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ALUMINA; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ION BEAMS; NICKEL ALLOYS; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; SUPERALLOYS; SURFACES;

ACCELERATED ION BEAMS; ALUMINUM OXIDE FILMS;

FILM PREPARATION;

EID: 0030563424     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01428-4     Document Type: Article

References (5)

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2. S.M. Rosnagel and J.J. Cuomo, Mater. Res. Soc. Bull. 12 (1987) 226.
3. Y. Ikegami, J. Shinohara and S. Nagano, IHI Engineering Review 23 (1990) 16.
4. F. Ida, J. Shinohara, T. Kunikyo and S.C.P. Cook, Proc. 18th AIAA Aerospace Ground Testing Conf. (1994) p. 2537.
5. S. Tanaka, M. Akiba, H. Horiike, M. Matsuoka, Y. Ohara and Y. Okumura, Rev. Sci. Instr. 57 (1986) 145.