Approach to formation of ultra-pure metal films by means of ion beam technology

Physica Status Solidi (A) Applied Research

Volumn 167, Issue 2, 1998, Pages 405-410

  Chayahara, A ^a   Horino, Y ^a   Tsubouchi, N ^a   Kinomura, A ^a   Fujii, K ^a  

^a OSAKA NATIONAL RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; IMPURITIES; ION BEAMS; PLASMAS; SPUTTER DEPOSITION; VACUUM APPLICATIONS;

DIRECT ION BEAM DEPOSITION; DROPLET FREE VACUUM ARC SOURCE; PLASMA DISCHARGES; ULTRA PURE METAL FILMS;

METALLIC FILMS;

EID: 0032097910     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-396X(199806)167:2<405::AID-PSSA405>3.0.CO;2-Y     Document Type: Article

References (4)

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3. A. CHAYAHARA, Y. MOKUNO, N. TSUBOUCHI, Y. HORINO. A. KINOMURA, and K. FUJII, Skin-ku 40, 300 (1997) (in Japanese).
4. Y. HORINO, N. TSUBOUCHI, B. ENDERS. C. HECK, A. CHAYAHARA. A. KINOMURA. and K. FUJII, phys. stat. sol, (a) 160, 583 (1997).