Development of a new ion-beam deposition technology for ultra-high-purity film fabrication

Physica Status Solidi (A) Applied Research

Volumn 160, Issue 2, 1997, Pages 583-589

  Hirino, Y ^a   Tsubouchi, N ^a   Enders, B ^a   Heck, C ^a   Chayahara, A ^a   Kinomura, A ^a   Fujii, K ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC CHARGE; ELECTRIC CURRENTS; ION BEAMS; NITRIDES; PRESSURE; TECHNOLOGY TRANSFER;

CARBON NITRIDE; ION BEAM DEPOSITION; ULTRA HIGH PURITY FILM FABRICATION;

FILM PREPARATION;

EID: 0031122398     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396x(199704)160:2<583::aid-pssa583>3.0.co;2-g     Document Type: Article

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