In situ Fourier transform infrared spectroscopy and stochastic modeling of surface chemistry of amorphous silicon growth

Journal of Applied Physics

Volumn 83, Issue 11, 1998, Pages 6096-6105

  Wetterauer, U ^a   Knobloch, J ^a   Hess, P ^a   Houle, F A ^b  

^a UNIVERSITY OF HEIDELBERG   (Germany)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN BONDS; LASER APPLICATIONS; MASS SPECTROMETRY; MATHEMATICAL MODELS; SILANES; SILICON COMPOUNDS; SURFACES; THIN FILMS;

DECONVOLUTION; DISILANE; LASER CHEMICAL VAPOR DEPOSITION; ONE DIMENSIONAL STOCHASTIC MODEL; SILICON HYDRIDE;

AMORPHOUS SILICON;

EID: 0032095481     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367503     Document Type: Article

References (36)

1. M. J. McCaughey and M. J. Kushner, J. Appl. Phys. 65, 186 (1989).
2. T. Shirafuji, W. Chen, M. Yamamuka, and K. Tachibana, Jpn. J. Appl. Phys., Part 1 32, 4946 (1993).
3. T. Ohira, O. Ukai, M. Noda, Y. Takeuchi, M. Murata, and H. Yoshida, Mater. Res. Soc. Symp. Proc. 408, 445 (1996).
4. H. Karstens, J. Knobloch, A. Winkler, A. Pusel, M. Barth, and P. Hess, Appl. Surf. Sci. 86, 521 (1995).
5. F. A. Houle and W. D. Hinsberg, Surf. Sci. 338, 329 (1985). The Chemical Kinetics Simulator™ program is available for downloading for a no-cost license on the IBM web-site "http://www.almaden.ibm.com/ st/msim/."
6. D. D. Koleske and S. M. Gates, J. Chem. Phys. 101, 3301 (1994).
7. S. K. Kulkarni, S. M. Gates, C. M. Greenlief, and H. H. Sawin, Surf. Sci. 239, 26 (1990).
8. R. Beccera and R. Walsh, J. Phys. Chem. 91, 5765 (1987).
9. G. A. A. Perkins and F. W. Lampe, J. Am. Chem. Soc. 102, 3764 (1980).
10. H. Karstens, dissertation, Institute of Physical Chemistry, University of Heidelberg, 1995.
11. B. L. Bunker, B. Garret, T. Kleindienst, and G. S. Long, III, Combust. Flame 23, 373 (1974).
12. D. T. Gillespie, J. Comput. Phys. 22, 403 (1976).
13. M. E. Coltrin, R. J. Kee, and J. A. Miller, J. Electrochem. Soc. 133, 1206 (1986).
14. R. M. Robertson and M. J. Rossi, Appl. Phys. Lett. 54, 185 (1989).
15. J. Perrin and T. Broekhuizen, Appl. Phys. Lett. 50, 435 (1987).
16. M. J. McCaughey and M. J. Kushner, Appl. Phys. Lett. 54, 1642 (1989).
17. S. M. Gates, C. M. Greenlief, and D. B. Bach, J. Chem. Phys. 93, 7493 (1990).
18. P. Gupta, V. L. Colvin, and S. M. George, Phys. Rev. B 37, 8234 (1988).
19. M. L. Wise, B. G. Kochler, P. Gupta, P. A. Coon, and S. M. George, Surf. Sci. 258, 166 (1991).
20. A. Matsuda, K. Nomoto, Y. Takeuchi, A. Suzuki, A. Yuuki, and J. Perrin, Surf. Sci. 227, 50 (1990).
21. D. A. Doughty, J. R. Doyle, G. H. Lin, and A. Gallagher, J. Appl. Phys. 67, 6220 (1990).
22. K. K. Gleason, K. S. Wang, M. K. Chen, and J. A. Reimer, J. Appl. Phys. 61, 2866 (1987).
23. G. H. Lin, J. R. Doyle, M. He, and A. Gallagher, J. Appl. Phys. 64, 188 (1988).
24. J. Knobloch, dissertation, Institute of Physical Chemistry, University of Heidelberg, 1997.
25. J. Knobloch and P. Hess, Appl. Phys. Lett. 69, 4041 (1996).
26. J. Knobloch and P. Hess, Mater. Res. Soc. Symp. Proc. 420, 455 (1996).
27. U. Jansson and K. J. Uram, J. Chem. Phys. 91, 7978 (1989).
28. Y. J. Chabal, G. S. Higashi, and S. B. Christman, Phys. Rev. B 28, 4473 (1983).
29. V. A. Burrows, Y. J. Chabal, G. S. Higashi, K. Raghavachari, and S. B. Christman, Appl. Phys. Lett. 53, 998 (1988).
30. M. Cardona, Phys. Status Solidi B 118, 463 (1983).
31. M. Katiyar, Y. H. Yang, and J. R. Abelson, J. Appl. Phys. 77, 6247 (1995).
32. G. S. Higashi, Y. J. Chabal, G. W. Trucks, and K. Raghavachari, Appl. Phys. Lett. 56, 656 (1990).
33. Y. J. Chabal, G. S. Higashi, K. Raghavachari, and V. A. Burrows, J. Vac. Sci. Technol. A 7, 2104 (1989).
34. G. Lucovsky, R. J. Nemanich, and J. C. Knights, Phys. Rev. B 19, 2064 (1979).
35. Y. Toyoshima, K. Arai, A. Matsuda, and K. Tanaka, J. Non-Cryst. Solids 137-138, 765 (1991).
36. R. W. Collins, I. An, H. V. Nguyen, Y. Li, and Y. Lu, Physics of Thin Films, edited by K. Vedam (Academic, New York, 1994), Vol. 19.