The role of adsorbed alkali metal atoms in the enhancement of surface reactivity: A scanning tunneling microscopy study of low coverage K/Si(111)7×7 surfaces

Journal of Chemical Physics

Volumn 108, Issue 23, 1998, Pages 9877-9884

  Gorelik, D ^a   Aloni, S ^a   Eitle, J ^a,b   Meyler, D ^a   Haase, G ^a  

^a WEIZMANN INSTITUTE OF SCIENCE   (Israel)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMS; DEPOSITION; IMAGING TECHNIQUES; POTASSIUM; SCANNING TUNNELING MICROSCOPY; SILICON;

SURFACE PHOTOVOLTAGE IMAGING; SURFACE REACTIVITY; TUNNELING BARRIER IMAGING;

SURFACE PHENOMENA;

EID: 0032095393     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.476426     Document Type: Article

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