Dynamics of Si plume produced by laser ablation in ambient inert gas and formation of Si nanoclusters

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 368-372

  Murakami, K ^a   Makimura, T ^a   Ono, N ^a   Sakuramoto, T ^a   Miyashita, A ^b   Yoda, O ^b  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

FT IR; Hydrogen treatment; Oxidation effect; Si nanoclusters; Time resolved soft X ray absorption measurement; Visible photoluminescence

Indexed keywords

ABSORPTION SPECTROSCOPY; HYDROGEN; INTERFACES (MATERIALS); NANOSTRUCTURED MATERIALS; OXIDATION; PHOTOLUMINESCENCE; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON; SURFACE PHENOMENA;

PULSED LASER ABLATION; X RAY ABSORPTION SPECTROSCOPY;

LASER ABLATION;

EID: 0032069495     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00657-0     Document Type: Article

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