Structural defects and hydrogen clustering in amorphous silicon

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 1, 1998, Pages 128-132

  Acco, S ^a   Williamson, D L ^b   Roorda, S ^c   Van Sark, W G J H M ^a   Polman, A ^d   Van Der Weg, W F ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

^b Department of Geology and Geological Engineering   (United States)

^c ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^d FOM INSTITUTE AMOLF   (Netherlands)

Author keywords

Amorphous silicon; Hydrogen clustering; Structural defects

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; DEFECTS; HYDROGENATION; ION IMPLANTATION; VOLUME FRACTION;

HYDROGEN CLUSTERING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SMALL ANGLE X RAY SCATTERING;

AMORPHOUS SILICON;

EID: 0032068685     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00219-1     Document Type: Article

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