SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 5 A, 1998, Pages 2646-2651

Barrier metal properties of amorphous tantalum nitride thin films between platinum and silicon deposited using remote plasma metal organic chemical vapor method

(8) Han, Chang Hee a Cho, Kwang Nam b Oh, Jae Eung b Paek, Su Hyoun a Park, Chang Soo c Lee, Sang In c Lee, Moon Yong c Lee, Jong Gil c

a Hanyang University (South Korea)

b Hanyang University (South Korea)

c SAMSUNG Electronics (South Korea)

Author keywords

Amorphous thin film; Diffusion barrier; MOCVD; Plasma process; Tantalum nitride; Thermal stability

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; NITRIDES; PLASMA SPRAYING; THERMODYNAMIC STABILITY; THIN FILMS;

DIFFUSION BARRIER;

TANTALUM COMPOUNDS;

EID: 0032064518 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.37.2646 Document Type: Article

Times cited : (17)

References (12)

1
- 0029271936
- S. H. Paek, J. H. Won and C. S. Park: J. Mater. Sci. Lett. 14 (1995) 322.
- (1995) J. Mater. Sci. Lett. , vol.14 , pp. 322
- Paek, S.H.¹ Won, J.H.² Park, C.S.³

2
- 0030212335
- Y. S. Hwang and S. H. Paek: J. Mater. Sci. 31 (1996) 4357.
- (1996) J. Mater. Sci. , vol.31 , pp. 4357
- Hwang, Y.S.¹ Paek, S.H.²

3
- 0001573618
- A. K. Pant, S. P. Murarka and C. Shepard: J. Appl. Phys. 72 (1992) 1833.
- (1992) J. Appl. Phys. , vol.72 , pp. 1833
- Pant, A.K.¹ Murarka, S.P.² Shepard, C.³

4
- 0346088307
- J. S. Reid, E. Kolawa, C. M. Garland, M.-A. Nicolet, F. Cardone, D. Gupta and R. P. Ruiz: J. Appl. Phys. 79 (1996) 1109.
- (1996) J. Appl. Phys. , vol.79 , pp. 1109
- Reid, J.S.¹ Kolawa, E.² Garland, C.M.³ Nicolet, M.-A.⁴ Cardone, F.⁵ Gupta, D.⁶ Ruiz, R.P.⁷

5
- 84955039864
- E. Kolawa, J. M. Molarius, C. W. Nieh and M.-A. Nicolet: J. Vac. Sci. Thechnol. A 8 (1990) 3006.
- (1990) J. Vac. Sci. Thechnol. A , vol.8 , pp. 3006
- Kolawa, E.¹ Molarius, J.M.² Nieh, C.W.³ Nicolet, M.-A.⁴

6
- 0001294471
- M. H. Tsai and S. C. Sun: J. Appl. Phys. 79 (1996) 6932.
- (1996) J. Appl. Phys. , vol.79 , pp. 6932
- Tsai, M.H.¹ Sun, S.C.²

7
- 0001404128
- H.-T. Chin and W.-P. Chang: J. Mater. Sci. Lett. 11 (1992) 570.
- (1992) J. Mater. Sci. Lett. , vol.11 , pp. 570
- Chin, H.-T.¹ Chang, W.-P.²

8
- 0002730905
- H.-T. Chin and W.-P. Chang: J. Mater. Sci. Lett. 11 (1992) 96.
- (1992) J. Mater. Sci. Lett. , vol.11 , pp. 96
- Chin, H.-T.¹ Chang, W.-P.²

9
- 0029517176
- S. C. Sun, M. H. Tsai, C. E. Tsai and H. T. Chiu: Symp. VLSI Technology Dig. Tech. Pap. (1995) 29.
- (1995) Symp. VLSI Technology Dig. Tech. Pap. , pp. 29
- Sun, S.C.¹ Tsai, M.H.² Tsai, C.E.³ Chiu, H.T.⁴

10
- 33645043712
- Joint Committee for Power Diffraction Standards, Power Diffraction File No. 32-1283, 25-922, 408-3 and 4-0788
- Joint Committee for Power Diffraction Standards, Power Diffraction File No. 32-1283, 25-922, 408-3 and 4-0788.

11
- 0004270257
- ed. G. E. Muilenberg Physical Electronicx, Eden Prairie
- C. D. Wagner, W. M. Riggs, L. E. Davis and J. F. Moulder: Handbook of XPS, ed. G. E. Muilenberg (Physical Electronicx, Eden Prairie, 1976).
- (1976) Handbook of XPS
- Wagner, C.D.¹ Riggs, W.M.² Davis, L.E.³ Moulder, J.F.⁴

12
- 0343843289
- S. Badriarayanan and S. Sinha: J. Appl. Phys. 69 (1991) 1141.
- (1991) J. Appl. Phys. , vol.69 , pp. 1141
- Badriarayanan, S.¹ Sinha, S.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.