The application of low-frequency glow discharge to high-rate deposition of a-Si:H

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 1, 1998, Pages 39-42

  Budaguan, Boris G ^a   Popov, Alexander A ^a   Sazonov, Andrei Yu ^a   Bosyakov, Mikhail N ^b   Grunsky, Dmitriy I ^b   Zhuk, Dmitriy W ^b  

^a NATIONAL RESEARCH UNIVERSITY OF ELECTRONIC TECHNOLOGY   (Russian Federation)

^b BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

Author keywords

Amorphous hydrogenated silicon; Glow discharge; Low frequency; Optical emission spectroscopy; Powder

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; DEPOSITION; EMISSION SPECTROSCOPY; FILM GROWTH; GLOW DISCHARGES; ION BOMBARDMENT; SILANES; SURFACE PHENOMENA;

OPTICAL EMISSION SPECTROSCOPY;

SEMICONDUCTING SILICON;

EID: 0032064406     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00021-0     Document Type: Article

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