Stability improvement of a-Si:H films for photovoltaic applications

Materials Research Society Symposium - Proceedings

Volumn 426, Issue , 1996, Pages 31-36

  Budaguan, B G ^a   Aivazov, A A ^a   Meytin, M N ^a  

^a NATIONAL RESEARCH UNIVERSITY OF ELECTRONIC TECHNOLOGY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; DIFFERENTIAL SCANNING CALORIMETRY; INFRARED SPECTROSCOPY; MICROSTRUCTURE; PHOTOVOLTAIC CELLS; PLASMA APPLICATIONS; REACTION KINETICS; RELAXATION PROCESSES; THERMAL EFFECTS;

LIGHT INDUCED DEFECT GENERATION KINETICS; LOW TEMPERATURE EXOTHERMIC PEAK (LTEP); STAEBLER-WRONSKI EFFECT;

SEMICONDUCTING FILMS;

EID: 0030411056     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-426-31     Document Type: Conference Paper

References (10)