A study of the O2-SO2 plasma etch chemistry for top surface imaging photoresist dry development

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 4 SUPPL. B, 1998, Pages 2373-2380

  Huang, Z S ^a   Melaku, Yosias ^a   Nguyen, Wendy ^a  

^a LAM RESEARCH CORPORATION   (United States)

Author keywords

Advanced photolithography; Dry development; Mass spectrometry; O2 SO2 plasma; Silylated photoresist; SO3 polymer; Top surface imaging

Indexed keywords

ANISOTROPY; DEPOSITION; DRY ETCHING; MASS SPECTROMETRY; PASSIVATION; PHOTORESISTS; POLYMERS; SULFUR DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

TOP SURFACE IMAGING (TSI) PHOTORESIST DRY DEVELOPMENT;

PLASMA ETCHING;

EID: 0032050103     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2373     Document Type: Article

References (17)

1. G. N. Taylor, R. S. Hutton, S. M. Stein, C. H. Boyce, O. R. Wood and D. R. Wheeler: Proc. SPIE 2437 (1995) 308.
2. J. Hutchinson, Y. Melaku, W. Nguyen and S. Das: Proc. SPIE 2724 (1996) 399.
3. B. J. Park, J. W. Kim, K. H. Baik and J. Vertommen: Microlithography World, Summer (1997) 24.
4. M. Pons, O. Joubert, C. Martinet, J. Pelletier, J. Penabiere and A. Weill: Jpn. J. Appl. Phys. 33 (1994) 991.
5. M. Pons, J. Pelletier and O. Joubert: J. Appl. Phys. 75 (1994) 4709.
6. R. S. Hutton, C. H. Boyce and G. Taylor: J. Vac. Sci. Technol. B 13 (1995) 2366.
7. Z. S. Huang and Yosias Melaku: to be published.
8. M. A. Hartney, D. W. Hess and D. S. Soane: J. Vac. Sci. Technol. B 7 (1989) 1.
9. W. Varhue and J. Burroughs: J. Appl. Phys. 72 (1992) 3050.
10. M. Pons, J. Pelletier, O. Joubert and P. Paniez: Jpn. J. Appl. Phys. 34 (1995) 3723.
11. D. Briggs: Electron Spectroscopy, Theory, Techniques and Applications, eds. C. R. Brundle and A. D. Baker (Academic Press, New York, 1979) Vol. 3, p. 306.
12. N. L. Craig, A. B. Harker and T. Novakov: Atmos. Environ. 8 (1974) 15.
13. A. Fahlman, K. Hamrin, J. Hedman, R. Nordberg, C. Nordling and K. Siegbahn: Nature 210 (1966) 4.
14. C. D. Wagner and D. M. Bickham: NIST XPS Database (NIST, Gaithersburg, MD, 1989) Ver. 1.0.
15. Linus Pauling: General Chemistry (Dover Publications, New York) p. 268.
16. R. D. Cadle and E. R. Allen: Science 167 (1970) 243.
17. S. Sachiko, T. N. Rao, D. H. Slater and J. Calvert: J. Phys. Chem. 73 (1969) 4412.