Sub-0.20-μm lithography using top-surface imaging with silylation

Microlithography World

Volumn 6, Issue 3, 1997, Pages 24-27

  Park, Byung Jun ^a   Kim, Jin Woong ^a   Baik, Ki Ho ^a   Vertommen, Johan ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; LIGHT REFLECTION;

CLUSTER TOOL SILYLATION; DRY DEVELOPMENT; TOP SURFACE IMAGING PROCESS WITH SILYLATION (TIPS) PATTERNING;

PHOTOLITHOGRAPHY;

EID: 0031167466     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (0)