WSi2/poly-Si gate etching using a TiON hard mask

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 4 SUPPL. B, 1998, Pages 2354-2358

  Tabara, Suguru ^a   Hibino, Satoshi ^a   Nakaya, Hiroshi ^a  

^a YAMAHA CORPORATION   (Japan)

Author keywords

Charging damage; Cl2 O2 plasma; Electron shading; Hard mask; High density plasma; Plasma etching; TiO2; TiON

Indexed keywords

ANTIREFLECTION COATINGS; CHEMICAL BONDS; MASKS; METALLIC FILMS; PHOTOLITHOGRAPHY; THIN FILMS; TITANIUM COMPOUNDS; TUNGSTEN COMPOUNDS;

ELECTRON SHADING EFFECTS;

PLASMA ETCHING;

EID: 0032048606     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2354     Document Type: Article

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