Study of the influence of gas chemistry on notching in metal etching

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 233-236

  Tabara, Suguru ^a   Kitayama, Yoshihiko ^a   Hatakeyama, Tadao ^a   Katsuragi, Ken ^a   Tanabe, Masafumi ^a  

^a YAMAHA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FREE RADICAL REACTIONS; HELIUM; HYDROCHLORIC ACID; ION BOMBARDMENT; SEMICONDUCTOR DEVICE STRUCTURES; VOLTAGE MEASUREMENT;

METAL ETCHING; TRANSFORMER COUPLED PLASMA (TCP);

PLASMA ETCHING;

EID: 0030706444     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)