Composition and microstructure of titanium nitride formed on Ti6Al4V by nitrogen plasma immersion ion implantation

Surface and Coatings Technology

Volumn 100-101, Issue 1-3, 1998, Pages 366-371

  Rinner, M ^a   Volz, K ^a   Ensinger, W ^a   Assmann, W ^b   Rauschenbach, B ^a  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b UNIVERSITY OF MUNICH   (Germany)

Author keywords

Crystallographic orientation relationship; Plasma Immersion Ion Implantation; Pulse repetition rate; TiN formation

Indexed keywords

CRYSTAL ORIENTATION; ELECTRON CYCLOTRON RESONANCE; ION IMPLANTATION; MICROSTRUCTURE; MORPHOLOGY; NITROGEN; PLASMA APPLICATIONS; SURFACE STRUCTURE; SURFACE TREATMENT; TITANIUM ALLOYS; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

ELASTIC RECOIL DETECTION ANALYSIS (ERD); PLASMA IMMERSION ION IMPLANTATION (PIII); PULSE REPETITION RATE;

TITANIUM NITRIDE;

EID: 0032024219     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00650-6     Document Type: Article

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