Electrodeposition of Ni on Cu(100): An in-situ STM study

Surface Science

Volumn 382, Issue 1-3, 1997, Pages 107-115

  Lachenwitzer, A ^a   Vogt, M R ^a   Magnussen, O M ^a   Behm, R J ^a  

^a UNIVERSITY OF ULM   (Germany)

Author keywords

Copper; Epitaxy; Growth; Metal electrolyte interface; Nickel; Nucleation; Scanning tunneling microscopy

Indexed keywords

COPPER; ELECTRODEPOSITION; EPITAXIAL GROWTH; INTERFACES (MATERIALS); MONOLAYERS; NUCLEATION; SCANNING TUNNELING MICROSCOPY; SOLID ELECTROLYTES; SURFACE ROUGHNESS;

PSEUDOMORPHIC MONOLAYERS;

NICKEL;

EID: 0031169533     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00110-6     Document Type: Article

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