Impact of rapid thermal annealing of Ti/TiN bilayers on subsequent chemical vapor deposition of tungsten

Materials Research Society Symposium - Proceedings

Volumn 427, Issue , 1996, Pages 365-370

  Mouroux, A ^a   Palmans, R ^a   Keinonen, J ^a   Zhang, S L ^a   Maex, K ^a   Petersson, S ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; HIGH TEMPERATURE EFFECTS; INTERFACES (MATERIALS); TITANIUM; TITANIUM NITRIDE;

POST TREATMENT; TENSILE STRESS; TITANIUM BILAYERS; TITANIUM NITRIDE BILAYERS;

SEMICONDUCTING FILMS;

EID: 0030383393     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)