Limitations of the process window for the bias enhanced nucleation of heteroepitaxial diamond films on silicon in the time domain

Journal of Applied Physics

Volumn 81, Issue 7, 1997, Pages 3092-3095

  Schreck, M ^a   Thurer K H ^a   Stritzker, B ^a  

^a UNIVERSITY OF AUGSBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000213502     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364319     Document Type: Article

References (13)

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