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Applied Surface Science

Volumn 123-124, Issue , 1998, Pages 376-380

Formation of polycrystalline silicon with log-normal grain size distribution

(4) Bergmann, Ralf B a Shi, Frank G a Queisser, Hans J a Krinke, Jörg b

a MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG (Germany)

b UNIVERSITY OF ERLANGEN NUREMBERG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; GRAIN SIZE AND SHAPE; NUCLEATION; PARTICLE SIZE ANALYSIS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS;

LOG NORMAL GRAIN SIZE DISTRIBUTION;

SEMICONDUCTING SILICON;

EID: 0031706365 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)00494-7 Document Type: Article

Times cited : (30)

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