Deposition and characterization of polycrystalline silicon films on glass for thin film solar cells

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 325-330

  Bergmann, R B ^a   Krinke, J ^a   Strunk, H P ^a   Werner, J H ^a  

^a MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; DOPING (ADDITIVES); GLASS; GRAIN SIZE AND SHAPE; PHOSPHORUS; SEMICONDUCTING SILICON; SILICON SOLAR CELLS; TRANSMISSION ELECTRON MICROSCOPY;

GRAIN SIZE DISTRIBUTION; OPTICAL IN SITU MONITORING; POLYCRYSTALLINE SILICON FILM; SOLID PHASE CRYSTALLIZATION; THIN FILM SOLAR CELL;

THIN FILMS;

EID: 0031333253     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-325     Document Type: Conference Paper

References (22)