Extended cavity ridge waveguide lasers operating at 1.5μm using a simple damage induced quantum well intermixing process

Electronics Letters

Volumn 33, Issue 23, 1997, Pages 1957-1958

  McDougall, S D ^a   Kowalski, O P ^a   Bryce, A C ^a   Marsh, J H ^a   Ironside, C N ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

Semiconductor junction lasers; Sputter deposition

Indexed keywords

OPTICAL WAVEGUIDES; PHOTORESISTS; SEMICONDUCTOR QUANTUM WELLS; SILICA; SPUTTER DEPOSITION;

EXTENDED CAVITY RIDGE WAVEGUIDE LASERS;

SEMICONDUCTOR LASERS;

EID: 0031556728     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19971310     Document Type: Article

References (6)

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