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Volumn 181, Issue 4, 1997, Pages 321-325
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A comparison of the reactions of phosphorus precursors on deposited GaP and InP films
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Author keywords
TBBDMAP; TBP; TDMAP
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Indexed keywords
ACTIVATION ENERGY;
CHEMICAL BEAM EPITAXY;
DECOMPOSITION;
PHOSPHORUS;
REACTION KINETICS;
SEMICONDUCTING GALLIUM COMPOUNDS;
SEMICONDUCTING INDIUM PHOSPHIDE;
TERTIARYBUTYL PHOSPHINE;
TERTIARYBUTYLBISDIMETHYLAMINO PHOSPHINE;
TRISDIMETHYLAMINOPHOSPHORUS;
SEMICONDUCTING FILMS;
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EID: 0031549815
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(97)00306-0 Document Type: Article |
Times cited : (10)
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References (12)
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