Large area deposition of ITO films by cluster type sputtering system

Journal of Non-Crystalline Solids

Volumn 218, Issue , 1997, Pages 354-359

  Ishibashi, Keiji ^a   Watabe, Kazufumi ^a   Sakurai, Takehiro ^a   Okada, Osamu ^a   Hosokawa, Naokichi ^a  

^a Anelva Corporation ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTAL STRUCTURE; ELECTRIC RESISTANCE MEASUREMENT; ETCHING; FILM PREPARATION; INDIUM COMPOUNDS; LIQUID CRYSTAL DISPLAYS; OXYGEN; PRESSURE EFFECTS; SPUTTER DEPOSITION;

CLUSTER SPUTTERING; INDIUM TIN OXIDE;

CONDUCTIVE FILMS;

EID: 0031549331     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00206-8     Document Type: Article

References (8)

1. N. Hosokawa, Thin Solid Films 281&282 (1996) 136.
2. K. Ishibashi, K. Watabe, N. Hosokawa, Thin Solid Films 281&282 (1996) 198.
3. Y. Shigesato, Y. Hayashi, T. Haranoh, Appl. Phys. Lett. 61 (1) (1992) 73.
4. H. Kitahara, T. Uchida, M. Atsumi, Y. Kaida, K. Ichikawa, in: Proc. 1st Int. Syrap. on ISSP'91, Tokyo, 1991, p. 149.
5. P.K. Song, Y. Shigesato, I. Yasui, in: Proc. Symp. on MRS-J, 1996, p. 131.
6. K. Ishibashi, K. Hirata, N. Hosokawa, J. Vac. Sci. Technol. A10 (4) (1992) 1718.
7. D.W. Hoffman, J. Vac. Sci. Technol. A8 (1990) 3703.
8. R.E. Somekh, J. Vac. Sci. Technol. A2 (3) (1984) 1285.