Large area deposition of ITO films by cluster type sputtering system

Journal of Non-Crystalline Solids

Volumn 218, Issue , 1997, Pages 354-359

  Ishibashi, Keiji ^a   Watabe, Kazufumi ^a   Sakurai, Takehiro ^a   Okada, Osamu ^a   Hosokawa, Naokichi ^a  

^a Magnetic Thin Film Development Division Process Development Center General Business Headquarters   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTAL STRUCTURE; ELECTRIC RESISTANCE MEASUREMENT; ETCHING; FILM PREPARATION; INDIUM COMPOUNDS; LIQUID CRYSTAL DISPLAYS; OXYGEN; PRESSURE EFFECTS; SPUTTER DEPOSITION;

CLUSTER SPUTTERING; INDIUM TIN OXIDE;

CONDUCTIVE FILMS;

EID: 0031549331     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00206-8     Document Type: Article

References (8)

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