Large area deposition: Sputtering- and PCVD-systems and techniques for LCD

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 136-142

  Hosokawa, Naokichi ^a  

^a Canon ANELVA Technix Corporation   (Japan)

Author keywords

Chemical vapour deposition; Sputtering

Indexed keywords

AMORPHOUS FILMS; CATHODES; CHEMICAL VAPOR DEPOSITION; ELECTRODES; FABRICATION; PLASMA APPLICATIONS; SEMICONDUCTING FILMS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILM TRANSISTORS; THIN FILMS;

PARALLEL PLATE RF ELECTRODES; PLANAR MAGNETRON CATHODES; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION;

LIQUID CRYSTAL DISPLAYS;

EID: 0030219234     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08594-X     Document Type: Article

References (8)

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