Repeatability of Si concentration measurements in Si-doped GaN films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2565-2568

  Chi, P H ^a   Simons, D S ^a   Wickenden, A E ^b   Koleske, D D ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031536034     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580772     Document Type: Article

References (15)

1. S. C. Binari, L. B. Rowland, W. Kruppa, G. Keiner, K. Doverspike, and D. K. Gaskill, Electron. Lett. 30, 1248 (1994).
2. S. Nakamura, M. Senoh, and T. Mukai, Appl. Phys. Lett. 62, 2390 (1993).
3. C. Wang and R. F. Davis, Appl. Phys. Lett. 63, 990 (1993).
4. T. C. Fu, N. Newman, E. Jones, J. K. Chan, X. Liu, M. D. Rubin, N. W. Cheung, and E. R. Weber, J. Electron. Mater. 24, 249 (1995).
5. H. Amano, M. Kito, K. Hiramatsu, and I. Akasaki, Jpn. J. Appl. Phys., Part 1 28, 2112 (1989).
6. A. Ishibashi, H. Takeishi, M. Mannoh, Y. Yabuuchi, and Y. Ban, J. Electron. Mater. 25, 799 (1996).
7. A. E. Wickenden, L. B. Rowland, K. Doverspike, D. K. Gaskill, J. A. Freitas, D. S. Simons, and P. H. Chi, J. Electron. Mater. 24, 1547 (1995).
8. R. G. Wilson, F. A. Stevie, and C. W. Magee, in Secondary Ion Mass Spectrometry: A Practical Handbook for Depth Profiling and Bulk Impurity Analysis (Wiley, New York, 1989), p. 3.1-1.
9. P. Williams and C. A. Evans, Jr., Surf. Sci. 78, 324 (1978).
10. L. Cha, W. Lin, Z. Jiang, Y. Tong, Z. Mo, and Q. Zou, Secondary Ion Mass Spectrometry VIII, edited by A. Benninghoven, K. T. F. Janssen, J. Tumpner, and H. W. Werner (Wiley, New York, 1991), p. 53.
11. W. M. Lau, Nucl. Instrum. Methods Phys. Res. B 16, 41 (1986).
12. R. Deng and P. Williams, Anal. Chem. 61, 1946 (1989).
13. Gayle Lux, in Secondary Ion Mass Spectrometry VII, edited by A. Benninghoven, H. W. Werner, and H. Storms (Wiley, New York, 1987), p. 123.
14. P. H. Chi and D. S. Simons, in Secondary Ion Mass Spectrometry VII, edited by A. Benninghoven, H. W. Werner, and H. Storm (Wiley, New York, 1987), p. 127.
15. P. Chu, S. Smith, and R. Bleiler, J. Vac. Sci. Technol. B 14, 3321 (1996).