X-ray diffraction and high resolution transmission electron microscopy of 3C-SiC/AlN/6H-SiC(0001)

Journal of Electronic Materials

Volumn 26, Issue 12, 1997, Pages 1389-1393

  Edgar, J H ^a   Yu, Z J ^a   Smith, David J ^b   Chaudhuri, J ^c   Cheng, X ^c  

^a Sunflower Networking Group   (United States)

^b ARIZONA STATE UNIVERSITY   (United States)

^c Wichita State University   (United States)

Author keywords

Chemical vapor deposition (CVD); High resolution transmission electron microscopy (HRTEM); SiC AlN

Indexed keywords

ALUMINUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; FILM PREPARATION; SILICON CARBIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CRYSTAL QUALITY; DOUBLE CRYSTAL X RAY ROCKING CURVES;

CERAMIC COATINGS;

EID: 0031366386     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-997-0056-1     Document Type: Article

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