Thermal stability of metal electrodes (Pt, Ru, & Ir) on polycrystalline silicon in ferroelectric capacitors

Integrated Ferroelectrics

Volumn 17, Issue 1-4, 1997, Pages 489-500

  Jeon, Yoo Chan ^a   Seon, Jeong Min ^a   Joo, Jae Hyun ^a   Ki Young, O H ^a   Roh, Jae Sung ^a   Kim, Jae Jeong ^a   Kim, Dae Sik ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Ferroelectric capacitors; Metal electrodes; Polycrystalline silicon

Indexed keywords

ANNEALING; CAPACITORS; DIFFUSION IN SOLIDS; FERROELECTRIC DEVICES; HIGH TEMPERATURE EFFECTS; IRIDIUM; OXIDATION; PLATINUM; POLYCRYSTALLINE MATERIALS; RUTHENIUM; SEMICONDUCTING SILICON; THERMODYNAMIC STABILITY;

ELECTRON BEAM EVAPORATION;

ELECTRODES;

EID: 0031353838     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589708013023     Document Type: Article

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