High damage threshold fluoride UV mirrors made by Ion beam sputtering

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3244, Issue , 1997, Pages 406-416

  Dijon, J ^a   Quesnel, E ^a   Rolland, B ^a   Garrec, P ^a   Peile C ^a   Hue, J ^a  

^a CEA LETI   (France)

Author keywords

Fluoride materials; Ion Beam Sputtering; Laser induced damage; Ultraviolet; UV coating

Indexed keywords

COMPRESSIVE STRESS; ENERGY GAP; ION BEAMS; MONOLAYERS; PHOTONS; SPUTTERING; ULTRAVIOLET RADIATION;

ION BEAM SPUTTERING;

LASER DAMAGE;

EID: 0031289583     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.306989     Document Type: Conference Paper

References (14)

1. Laser induced damage in optical materials
2. High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers
3. Influence of substrate cleanings on LIDT of 355nm HR coatings
4. Optical losses of fluoride coatings for UV/VUV applications deposited by reactive IAD and IBS processes
5. Nano absorbing centers: A key point in the laser damage of thin films
6. The CMO YAG laser damage test facility
7. Thin film laser damage mechanisms at the YAG third harmonic