Influence of substrate cleaning on LIDT of 355 nm HR coatings

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2966, Issue , 1997, Pages 178-186

  Dijon, Jean ^a   Garrec, Pierre ^a   Kaiser, Norbert ^b   Schallenberg, Uwe B ^b  

^a CEA LETI   (France)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

High reflector; Laser damage; Nd:YAG third harmonic; Substrate cleaning; Thin films; Ultra violet

Indexed keywords

FILMS; LASER APPLICATIONS; LASER DAMAGE; LASERS; NEODYMIUM; NEODYMIUM LASERS; OPTICAL MATERIALS; OXIDE MINERALS; PULSED LASER APPLICATIONS; QUARTZ; REFLECTION; SILICON COMPOUNDS; THIN FILMS;

BEAM EVAPORATIONS; COATED SUBSTRATES; DAMAGE TESTS; DAMAGE THRESHOLDS; HIGH REFLECTOR; HR COATINGS; ND:YAG THIRD HARMONIC; PULSE WIDTHS; QUARTZ SUBSTRATES; SUBSTRATE CLEANING; ULTRA VIOLET;

SUBSTRATES;

EID: 0000852868     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.274290     Document Type: Conference Paper

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