SCOPUS 정보 검색 플랫폼

Volumn 144, Issue 11, 1997, Pages 3963-3967

Silanol concentration depth profiling during plasma deposition of SiO2 using multiple internal reflection infrared spectroscopy

(2) Han, Sang M a,b Aydil, Eray S a,b

a University of California (United States)

b ELECTROCHEMICAL SOCIETY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); NUMERICAL METHODS; PLASMA APPLICATIONS; REFLECTION;

MULTIPLE INTERNAL REFLECTION INFRARED SPECTROSCOPY; PLASMA DEPOSITION; SILANOL;

SILICA;

EID: 0031271365 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1838119 Document Type: Article

Times cited : (15)

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