Anisotropic-etching simulation of InP and Si

Sensors and Actuators, A: Physical

Volumn 63, Issue 2, 1997, Pages 141-146

  Chahoud, Mohsen ^a   Wehmann, Hergo Heinrich ^a   Schlachetzki, Andreas ^a  

^a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

Anisotropic etching; Etching simulation; Indium phosphide; Silicon

Indexed keywords

COMPUTER SIMULATION; CRYSTALLINE MATERIALS; DIAMONDS; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTING SILICON;

ANISOTROPIC ETCHING;

ETCHING;

EID: 0031257977     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)01535-5     Document Type: Article

References (15)

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