메뉴 건너뛰기




Volumn 18, Issue 10, 1997, Pages 480-482

Empirical model for the low-frequency noise of hot-carrier degraded submicron LDD MOSFET's

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; HOT CARRIERS; MATHEMATICAL MODELS; NUMERICAL METHODS; SEMICONDUCTOR DEVICE MANUFACTURE; SPURIOUS SIGNAL NOISE; TRANSCONDUCTANCE;

EID: 0031257014     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.624921     Document Type: Article
Times cited : (20)

References (14)
  • 1
    • 84990709854 scopus 로고
    • Impact of scaling down on low-frequency noise in silicon MOS transistors
    • G. Ghibaudo, O. Roux-dit-Buisson, and J. Brini, "Impact of scaling down on low-frequency noise in silicon MOS transistors," Phys. Stat. Sol. (a), vol. 132, pp. 501-507, 1992.
    • (1992) Phys. Stat. Sol. (A) , vol.132 , pp. 501-507
    • Ghibaudo, G.1    Roux-dit-Buisson, O.2    Brini, J.3
  • 2
    • 0028549082 scopus 로고
    • The impact of device scaling on the current fluctuations in MOSFET's
    • M.-H. Tsai and T.-P. Ma, "The impact of device scaling on the current fluctuations in MOSFET's," IEEE Trans. Electron Devices, vol. 41, pp. 2061-2068, 1994.
    • (1994) IEEE Trans. Electron Devices , vol.41 , pp. 2061-2068
    • Tsai, M.-H.1    Ma, T.-P.2
  • 3
    • 0029252819 scopus 로고
    • The effects of plasma etching induced gate oxide degradation on MOSFET's 1/f noise
    • C. Hu, J. Zhao, G. P. Li, E. Worley, J. White, and R. Kjar, "The effects of plasma etching induced gate oxide degradation on MOSFET's 1/f noise," IEEE Electron Device Lett., vol. 16, pp. 61-63, 1995.
    • (1995) IEEE Electron Device Lett. , vol.16 , pp. 61-63
    • Hu, C.1    Zhao, J.2    Li, G.P.3    Worley, E.4    White, J.5    Kjar, R.6
  • 4
    • 0012278046 scopus 로고
    • Noise in solid-state microstructures: A new perspective on individual defects, interface states, and low-frequency (1/f) noise
    • M. J. Kirton and M. J. Uren, "Noise in solid-state microstructures: A new perspective on individual defects, interface states, and low-frequency (1/f) noise," Adv. Phys., vol. 38, pp. 367-468, 1989.
    • (1989) Adv. Phys. , vol.38 , pp. 367-468
    • Kirton, M.J.1    Uren, M.J.2
  • 6
    • 0021486398 scopus 로고
    • Effect of hot-electron stress on low-frequency MOSFET noise
    • J. M. Pimbley and G. Gildenblat, "Effect of hot-electron stress on low-frequency MOSFET noise," IEEE Electron Device Lett., vol. EDL-5, pp. 345-347, 1984.
    • (1984) IEEE Electron Device Lett. , vol.EDL-5 , pp. 345-347
    • Pimbley, J.M.1    Gildenblat, G.2
  • 7
    • 0022735850 scopus 로고
    • Analysis of hot-carrier-induced aging from 1/f noise in short-channel MOSFET's
    • Z. H. Fang, S. Cristoloveanu, and A. Chovet, "Analysis of hot-carrier-induced aging from 1/f noise in short-channel MOSFET's," IEEE Electron Device Lett., vol. EDL-7, pp. 371-373, 1986.
    • (1986) IEEE Electron Device Lett. , vol.EDL-7 , pp. 371-373
    • Fang, Z.H.1    Cristoloveanu, S.2    Chovet, A.3
  • 8
    • 0027553264 scopus 로고
    • The effect of hot-electron injection on the properties of flicker noise in n-channel MOSFET's
    • C.-H. Cheng and C. Surya, "The effect of hot-electron injection on the properties of flicker noise in n-channel MOSFET's," Solid-State Electron., vol. 36, pp. 475-479, 1993.
    • (1993) Solid-State Electron. , vol.36 , pp. 475-479
    • Cheng, C.-H.1    Surya, C.2
  • 9
    • 0029321553 scopus 로고
    • Study of hot-carrier degradation in submicrometer LDD NMOSFET's from 1/f noise and charge pumping current measurements at different temperature anneals
    • D. S. Ang, C. H. Ling, and Y. T. Yeow, "Study of hot-carrier degradation in submicrometer LDD NMOSFET's from 1/f noise and charge pumping current measurements at different temperature anneals," Microelectron. Eng., vol. 28, pp. 257-260, 1995.
    • (1995) Microelectron. Eng. , vol.28 , pp. 257-260
    • Ang, D.S.1    Ling, C.H.2    Yeow, Y.T.3
  • 10
    • 0038442878 scopus 로고
    • Degraded noise characteristics of submicrometer area field effect transistors subjected to plasma etching and Fowler-Nordheim stress
    • S. T. Martin, G. P. Li, E. Worley, and J. White, "Degraded noise characteristics of submicrometer area field effect transistors subjected to plasma etching and Fowler-Nordheim stress," Appl. Phys. Lett., vol. 67, pp. 2860-2862, 1995.
    • (1995) Appl. Phys. Lett. , vol.67 , pp. 2860-2862
    • Martin, S.T.1    Li, G.P.2    Worley, E.3    White, J.4
  • 11
    • 0030108606 scopus 로고    scopus 로고
    • Hole-induced 1/f noise increase in MOS transistors
    • M. Aoki and M. Kato, "Hole-induced 1/f noise increase in MOS transistors," IEEE Electron Device Lett., vol. 17, p. 118-120, 1996.
    • (1996) IEEE Electron Device Lett. , vol.17 , pp. 118-120
    • Aoki, M.1    Kato, M.2
  • 12
    • 0031642742 scopus 로고    scopus 로고
    • A low-frequency noise study of hot-carrier stressing effects in submicron Si p-MOSFET's
    • to be published
    • P. Vasina, E. Simoen, C. Claeys, and J. Sikula, "A low-frequency noise study of hot-carrier stressing effects in submicron Si p-MOSFET's," Microelectron. Reliab., to be published.
    • Microelectron. Reliab.
    • Vasina, P.1    Simoen, E.2    Claeys, C.3    Sikula, J.4
  • 13
    • 0042316320 scopus 로고
    • Empirical relationship between the low-frequency noise spectral density and the transconductance of SOI n-MOSFET's
    • E. Simoen and C. Claeys, "Empirical relationship between the low-frequency noise spectral density and the transconductance of SOI n-MOSFET's," Appl. Phys. Lett., vol. 65, pp. 1946-1948, 1994.
    • (1994) Appl. Phys. Lett. , vol.65 , pp. 1946-1948
    • Simoen, E.1    Claeys, C.2
  • 14
    • 0029358574 scopus 로고
    • Correlation between the low-frequency noise spectral density and the static device parameters of silicon-on-insulator MOSFET's
    • _, "Correlation between the low-frequency noise spectral density and the static device parameters of silicon-on-insulator MOSFET's," IEEE Trans. Electron Devices, vol. 42, pp. 1467-1472, 1995.
    • (1995) IEEE Trans. Electron Devices , vol.42 , pp. 1467-1472


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.