Modeling, project, numerical simulation, and AES temperature diagnostics of an inductively coupled plasma torch for the deposition of high-purity fused silica for optical waveguide production

IEEE Transactions on Plasma Science

Volumn 25, Issue 5, 1997, Pages 1073-1080

  Colombo, V ^a   Panciatichi, C ^a   Zazo, A ^a   Cocito, G ^a   Cognolato, L ^a  

^a UNIVERSITY OF BOLOGNA   (Italy)

Author keywords

Optical fiber fabrication; Optical spectroscopy; Plasma materials processing applications; Plasma torches; Simulation

Indexed keywords

ATOMIC SPECTROSCOPY; BOUNDARY CONDITIONS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; ELECTRIC DISCHARGES; ELECTROMAGNETIC FIELDS; EMISSION SPECTROSCOPY; FUSED SILICA; OPTICAL FIBERS; OPTICAL WAVEGUIDES; SYNTHESIS (CHEMICAL); TEMPERATURE MEASUREMENT;

INDUCTIVELY COUPLED PLASMAS;

PLASMA TORCHES;

EID: 0031250435     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.649628     Document Type: Article

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