Synchrotron radiation characterization of metal silicide thin films: Some observations

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 580-584

  Naftel, S J ^a   Coulthard, I ^a   Sham, T K ^a   Xu, D X ^b   Erickson, L ^b   Das, S R ^b  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Salicide thin films and lines; Si L3,2 edge; Synchrotron radiation; X ray absorption fine structures

Indexed keywords

ANNEALING; ELECTRONS; FLUORESCENCE; NICKEL COMPOUNDS; PHASE TRANSITIONS; PLATINUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE STRUCTURES; SYNCHROTRON RADIATION; THERMAL EFFECTS; X RAY ANALYSIS;

SELF ALIGNED SILICIDES; X RAY ABSORPTION FINE STRUCTURES (XAFS);

THIN FILMS;

EID: 0031249587     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00492-6     Document Type: Article

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