Comparison of carbon, aluminum, silicon and copper films deposited by high peak intensity laser ablation

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 10 PART A, 1997, Pages

  Sato, Shunichi ^a   Yoneyama, Toshio ^a   Horaguchi, Takeo ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Ablation; Aluminum; Carbon; Copper; High peak power laser; SEM; Silicon; Thin film; XPS

Indexed keywords

ALUMINUM; CARBON; COPPER; DEPOSITION; PULSED LASER APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SILICON; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

PULSED LASER DEPOSITION (PLD);

LASER ABLATION;

EID: 0031248988     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l1328     Document Type: Review

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