Vibrational spectroscopy of mixed hexagonal-cubic boron nitride thin films

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 107-112

  Beghi, M G ^a   Bottani, C E ^a   Miotello, A ^b   Ossi, P M ^a  

^a POLITECNICO DI MILANO   (Italy)

^b UNIVERSITY OF TRENTO   (Italy)

Author keywords

Auger electron spectroscopy; Cubic boron nitride; Infrared spectroscopy; Raman spectroscopy; Reactive ion assisted deposition

Indexed keywords

ARGON; AUGER ELECTRON SPECTROSCOPY; CUBIC BORON NITRIDE; FILM PREPARATION; INFRARED SPECTROSCOPY; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; SUBSTRATES; VAPOR DEPOSITION;

HEXAGONAL CUBIC BORON NITRIDE THIN FILMS; NANOINDENTATION; REACTIVE ION ASSISTED DEPOSITION; VIBRATIONAL SPECTROSCOPY;

THIN FILMS;

EID: 0031248474     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00380-5     Document Type: Article

References (26)

1. D.L. Medlin, T.A. Friedmann, P.B. Mirkarimi, M.J. Mills and K.P. McCarty, Phys. Rev., B50 (1993) 7884.
2. M. Satoh, K. Yamaguchi, Y. Andoh, Y. Suzuki, K. Matsuda and F. Fujimoto, Nucl. Instrum. Methods Phys. Res., B 7-8 (1985) 299.
3. T. Ikeda, Appl. Phys. Lett., 61 (1992) 786.
4. M. Murakawa and S. Watanabe, Surf. Coat. Technol., 43-44 (1990) 128.
5. M. Mieno and T. Yoshida, Jpn. J. Appl. Phys., 29 (1990) 1175.
6. H. Lüthje, K. Bewilogua, S. Daaud, M. Johansson and L. Hultman, Thin Solid Films, 257 (1995) 40.
7. J. Hahn, M. Friedrich, R. Pintaske, M. Schaller, N. Kahl, D.R.T. Zahn and F. Richter, Diam. Related Mater., 5 (1996) 1103.
8. S. Ulrich, J. Scherer, J. Schwan, I. Barzen, K. Jung, M. Scheib and H. Erhardt, Appl. Phys. Lett., 68 (1996) 909.
9. J.D. Kester and R. Messier, J. Appl. Phys., 72 (1992) 504.
10. G. Sene, D. Bouchier, S. Ilias, M.A. Djouadi, J. Pascallon, V. Stambouli, P. Moller and G. Hug, Diam. Related Mater., 5 (1996) 530.
11. T. Ichiki, S. Amagi and T. Yoshida, J. Appl. Phys., 79 (1996) 4381.
12. S. Reinke, M. Kuhr and W. Kulish, Diam. Related Mater., 3 (1994) 341.
13. W. Dworschak, K. Jung and H. Ehrhardt, Thin Solid Films, 254 (1995) 65.
14. R. Capelletti, M. Elena, A. Miotello and P.M. Ossi, Appl. Surf. Sci., 108 (1997) 33.
15. M. Bonelli, L. Calliari, M. Elena, M.A. Ghabashy, L. Guzman, A. Miotello and P.M. Ossi, Surf. Coat. Technol., 49 (1991) 150.
16. R. Geick, C.H. Perry and G. Rupprecht, Phys. Rev., 146 (1966) 543.
17. P.J. Gielisse, S.S. Mitra, J.N. Plendl, R.D. Griffis, L.C. Mansur, R. Marshall and E.A. Pascoe, Phys. Rev., 155 (1967) 1039.
18. R. Ganzetti and W. Gissler, in: T.S. Sudarshan, K. Ishizaki, M. Takata and K. Kamata (eds.), Surf. Modif. Technol. VII, The Institute of Materials, London, 1994, p. 585.
19. M.J. Rand and J.F. Roberts, J. Electrochem. Soc.: Solid State Sci., 115 (1968) 423.
20. R.J. Nemanich, S.A. Solin and R.M. Martin, Phys. Rev., B23 (1981) 6348.
21. M.I. Eremets, M. Gauthier, A. Polian, J.C. Chervin, J.M. Besson, G.A. Dubitskii and Y.Y. Semenova, Phys. Rev., B52 (1995) 8854.
22. J.L. Andujar, E. Pascual, R. Aguiar, E. Bertran, A. Bosch, J.L. Fernandez, S. Gimeno, A. Lousa and M. Varela, Diam. Related Mater., 4 (1995) 657.
23. F.M. Doerner and W.D. Nix, J. Mater. Res., 1 (1986) 601.
24. W. Gissler, J. Haupt, T.A. Crabb, P.N. Gibson and D.G. Rickerby, Mater. Sci. Eng., A139 (1991) 284.
25. M. Elena, L. Guzman, L. Calliari, L. Moro, A. Steiner, A. Miotello, M. Bonelli, R. Capelletti and P.M. Ossi, Thin Solid Films, 253 (1994) 78.
26. W.E. King and R. Benek, J. Nucl. Mater., 117 (1983) 26.