Chemical-mechanical polishing of oxide thin films: The rebinder-westwood phenomenon revisited

Journal of Electronic Materials

Volumn 25, Issue 10, 1996, Pages 1581-1584

  Rajan, Krishna ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

Chemical mechanical polishing; Environmentally sensitive fracture; Fourier transform infrared spectroscopy (FTIR); Oxide films; Surface plasticity; Zeta potential

Indexed keywords

EID: 0348085151     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02655579     Document Type: Article

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