The adsorption of silane, disilane and trisilane on polycrystalline silicon: A transient kinetic study

Surface Science

Volumn 367, Issue 3, 1996, Pages 321-339

  Weerts, W L M ^a,b   De Croon, M H J M ^a   Marin, G B ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Adsorption kinetics; Chemisorption; Models of surface kinetics; Molecule solid reactions; Silane; Silicon; Surface chemical reaction

Indexed keywords

CHEMISORPTION; HYDROGEN BONDS; MATHEMATICAL MODELS; POLYCRYSTALS; REACTION KINETICS; SILANES; SILICON;

ADSORPTION KINETICS; DUAL-SITE ADSORPTION MECHANISM; SURFACE CHEMICAL REACTIONS; SURFACE KINETICS MODEL;

ADSORPTION;

EID: 0030393825     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)00876-X     Document Type: Article

References (31)

1. S.M. Gates, C.M. Greenlief and D.B. Beach, J. Chem. Phys. 93 (1990) 7493.
2. S.K. Kulkarni, S.M. Gates, C.M. Greenlief and H.H. Sawin, Surf. Sci. 239 (1990) 26.
3. K. Sinniah, M.G. Sherman, L.D. Lewis, W.H. Weinberg, J.T. Yates, Jr. and K.C. Janda, Phys. Rev. Lett. 62 (1989) 567.
4. M.L. Wise, B.G. Koehler, P. Gupta, P.A. Coon and S.M. George, Surf. Sci. 258 (1991) 166.
5. M.K. Farnaam and D.R. Olander, Surf. Sci. 145 (1984) 390.
6. S.K. Kulkarni, S.M. Gates, B.A. Scott and H.H. Sawin, Surf. Sci. 239 (1990) 13.
7. K. Werner, S. Butzke, S. Radelaar and P. Balk, J. Cryst. Growth 136 (1994) 322.
8. R.J. Buss, P. Ho, W.G. Breiland and M.E. Coltrin, J. Appl. Phys. 63 (1988) 2808.
9. J.T. Gleaves, J.R. Ebner and T.C. Kuechler, Catal. Rev. Sci. Eng. 30 (1988) 49.
10. G.L. Svoboda, J.T. Gleaves and P.L. Mills, Ind. Eng. Chem. Res. 31 (1992) 19.
11. D.W. Marquardt, J. Soc. Ind. Appl. Math. 11 (1963) 431.
12. N.R. Draper and H. Smith, Applied Regression Analysis (Wiley, New York, 1966).
13. W.L.M. Weerts, PhD Thesis, Eindhoven, 1995.
14. S.M. Gates, C.M. Greenlief, D.B. Beach and R.R. Kunz, Chem. Phys. Lett. 154 (1989) 505.
15. S.M. Gates and S.K. Kulkarni, Appl. Phys. Lett. 58 (1991) 2963.
16. S.M. Gates, Surf. Sci. 195 (1988) 307.
17. J.P. Huinink, PhD Thesis, Eindhoven, 1995.
18. D.S. Zou, M.P. Dudukovic and P.L. Mills, J. Catal. 145 (1994) 683.
19. NAG Ltd, Fortran Library Manual, #15 (Wilkinson House, Oxford, 1991).
20. B.D. Eldridge and L.F. Brown, AIChE J. 22 (1976) 942.
21. P. Clausing, Physica 9 (1929) 65.
22. D.G. Coronell and K.F. Jensen, J. Electrochem. Soc. 139 (1992) 2264.
23. M.P. D'Evelyn, Y.L. Yang and L.F. Sutcu, J. Chem. Phys. 96 (1992) 852.
24. K.W. Kolasinski, S.F. Shane and R.N. Zare, J. Chem. Phys. 95 (1991) 5482.
25. J.J. Boland, J. Vac. Sci. Technol. A 10 (1992) 2458.
26. M.C. Flowers, N.B.H. Jonathan, Y. Liu and A. Morris, J. Chem. Phys. 99 (1993) 7038.
27. J. Holleman and J.F. Verweij, J. Electrochem. Soc. 140 (1993) 2089.
28. H. Kanoh, O. Sugirura and M. Matsumura, Jpn. J. Appl. Phys. 32 (1993) 2613.
29. S.M. Gates and S.K. Kulkarni, Appl. Phys. Lett. 60 (1992) 53.
30. P. Ho, M.E. Coltrin and W.O. Breiland, J. Phys. Chem. 98 (1994) 10138.
31. J.N. Jasinski and S.M. Gates, Acc. Chem. Res. 24 (1991) 9.