Neural networks application for OPC (optical proximity correction ) in mask making

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 161-164

  Jedrasik, P ^a  

^a UNIVERSITY OF LODZ   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; COHERENT LIGHT; DIFFRACTION; FOURIER TRANSFORMS; IMAGING SYSTEMS; MASKS; PROBLEM SOLVING; TESTING;

ELECTRON PROXIMITY CORRECTION; ELECTRON PROXIMITY EFFECTS; FEATURE ASSISTED TECHNIQUE; FEATURE BIASING TECHNIQUE; GABOR THEORY; HOPKINS EQUATIONS; OPTIMAL PROXIMITY CORRECTION;

NEURAL NETWORKS;

EID: 0029732180     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00218-9     Document Type: Article

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