New frontiers in plasma etching

Semiconductor International

Volumn 19, Issue 8, 1996, Pages 152-164

  Singer, Peter ^a  

^a NONE

Author keywords

Etching; Plasma sources; Process windows

Indexed keywords

EID: 4143088893     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)

1. P. Burggraaf, "Advanced Plasma Sources: What's Working?" Semiconductor International, May 1994, p. 56.
2. D. Ma et al., "Metal Etch for Sub-half-micron Devices," in this issue.
3. K. Mautz, "Characterization of Single Wafer and Batch Metal Etch Manufacturing Processes," VMIC 1996.
4. P. Singer, "Meeting Oxide, Poly and Metal Etch Requirements," Semiconductor International, April 1993, p. 50.
5. P. Singer, "Electrostatic Chucks in Wafer Processing," Semiconductor International, April 1995, p. 57.