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Volumn 15, Issue 4, 1997, Pages 1437-1441
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Formation of Si nanowire by atomic manipulation with a high temperature scanning tunneling microscope
a a,c a b,d |
Author keywords
[No Author keywords available]
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Indexed keywords
ACTIVATION ENERGY;
BOUNDARY CONDITIONS;
CURRENT VOLTAGE CHARACTERISTICS;
ETCHING;
POLYCRYSTALLINE MATERIALS;
SCANNING TUNNELING MICROSCOPY;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE STRUCTURES;
SUBSTRATES;
SURFACES;
TRANSMISSION ELECTRON MICROSCOPY;
ATOMIC MANIPULATION;
ELECTROCHEMICAL ETCHING;
ELECTROMIGRATION EFFECTS;
HIGH TEMPERATURE SCANNING TUNNELING MICROSCOPE;
SURFACE DIFFUSION;
SEMICONDUCTOR QUANTUM WIRES;
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EID: 0031192988
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.589468 Document Type: Article |
Times cited : (26)
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References (16)
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