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Volumn 15, Issue 4, 1997, Pages 1437-1441

Formation of Si nanowire by atomic manipulation with a high temperature scanning tunneling microscope

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BOUNDARY CONDITIONS; CURRENT VOLTAGE CHARACTERISTICS; ETCHING; POLYCRYSTALLINE MATERIALS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; SUBSTRATES; SURFACES; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0031192988     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589468     Document Type: Article
Times cited : (26)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.