Layer-by-layer atomic manipulation on Si(111)-7×7 surface

Applied Physics Letters

Volumn 68, Issue 24, 1996, Pages 3482-3484

  Komeda, T ^a   Hasunuma, R ^a   Mukaida, H ^a   Tokumoto, H ^b  

^a JT RES CENTER FOR ATOM TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343726721     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115765     Document Type: Article

References (14)

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