Study of unipolar pulsed ramp and combined ramped/constant voltage stress on MOS gate oxides

Microelectronics Reliability

Volumn 37, Issue 7 SPEC. ISS., 1997, Pages 1045-1051

  Martin, A ^a   O'Sullivan, P ^a   Mathewson, A ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC BREAKDOWN OF SOLIDS; GATES (TRANSISTOR); STRESSES; VOLTAGE MEASUREMENT;

FOWLER NORDHEIM TUNNELING; STAIRCASE RAMP;

MOS DEVICES;

EID: 0031191106     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0026-2714(96)00267-3     Document Type: Article

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