Electric field dependent dielectric breakdown of intrinsic SiO2 films under dynamic stress

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1996, Pages 61-66

  Chaparala, Prasad ^a   Suehle, John S ^a   Messick, Cleston ^a   Roush, Marvin ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PROPERTIES; ELECTRIC BREAKDOWN; ELECTRIC FIELD EFFECTS; RELIABILITY; SILICA; STRESSES; THERMAL EFFECTS; THIN FILMS;

DYNAMIC STRESS; GATE DIELECTRICS; STATIC STRESS TESTING; TIME DEPENDENT DIELECTRIC BREAKDOWN;

DIELECTRIC FILMS;

EID: 0029708613     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)