Combined real-time and run-to-run control of etch depth and spatial uniformity in plasma etching

Journal of the Electrochemical Society

Volumn 144, Issue 7, 1997, Pages 2473-2479

  Hankinson, Matt ^a   Vincent, Tyrone L ^a   Irani, Keki ^a   Khargonekar, Pramod P ^a  

^a The Department of Civil and Environmental Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLOSED LOOP CONTROL SYSTEMS; FEEDBACK CONTROL; INTEGRATED CONTROL; OXYGEN; REACTIVE ION ETCHING; REAL TIME SYSTEMS;

RUN TO RUN CONTROL;

PLASMA ETCHING;

EID: 0031187863     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837839     Document Type: Article

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