Simultaneous control of multiple measures of nonuniformity using site models and monitor wafer control

IEEE Transactions on Semiconductor Manufacturing

Volumn 9, Issue 1, 1996, Pages 128-135

  Saxena, Sharad ^a,b   Mozumder, Purnendu K ^a,b   Taylor, Kelly J ^b  

^a IEEE

^b TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONTROL EQUIPMENT; MATHEMATICAL MODELS; PLASMA APPLICATIONS; PROCESS CONTROL;

MONITOR WAFER CONTROLLER; NONUNIFORMITY; PROCESS SPECIFICATIONS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030086649     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.484293     Document Type: Article

References (12)

1. J. K. Kibarian and A. J. Strojwas, "Using spatial information to analyze correlations between test structure data," IEEE Trans. Semicond. Manufact., vol. 4, no. 3, pp. 219-225, Aug. 1991.
2. P. K. Mozumder and L. M. Loewenstein, "Method of semiconductor process optimization using functional representations of spatial variations and selectivity," IEEE Trans. Comp., Hybrids, Manufact. Technol., vol. 15, pp. 311-316, June 1992.
3. R. S. Guo and E. Sachs, "Modeling, optimization, and control, of spatial uniformity in manufacturing processes," IEEE Trans. Semicond. Manufact., vol. 6, no. 1, pp. 41-57, Feb. 1993.
4. J. Stefani and S. W. Butler, "Demonstration of run-by-run control of within-wafer polysilicon film thickness uniformity after plasma etching," in Proc. 3rd Int. Symp. Process Physics and Modeling, Honolulu, HI, May 1993.
5. E. Sachs, A. Hu, and A. Ingolfsson, "Run by run process control: Combining SPC and feedback control," IEEE Trans. Semicond. Manufact., vol. 8, no. 1, pp. 26-43, 1995.
6. S. W. Butler and J. A. Stefani, "Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry," IEEE Trans. Semicond. Manufact., vol. 7, no. 2, pp. 184-192, June 1994.
7. S. Ha, "On-Line Control of Process Uniformity Using Categorized Variabilities," Ph.D. dissertation, Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, 1993.
8. G. E. P. Box and N. R. Draper, Empirical Model Building and Response Surfaces. New York: Wiley, 1987.
9. Bob Wheeler. ECHIP™ Course Text. ECHIP Inc., 724 Yorklyn Rd., Hockessin, DE 19707, 1989.
10. SAS Institute, Inc., SAS Circle, BOX 8000, Cary, NC27512-8000. SAS Language Guide, Release 6.03 ed., 1988.
11. P. K. Mozumder, S. Saxena, and D. J. Collins, "A monitor wafer based controller for semiconductor processes," IEEE Trans. Semicond. Manufact., vol. 7, no. 3, pp. 400-411, Aug. 1994.
12. P. E. Gill, W. Murray, M. A. Saunders, and M. H. Wright. Users's Guide for NPSOL (Version 4.0): A Fortran Package for Nonlinear Programming, Stanford University, Stanford, California 94305, 1986.