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Volumn 257, Issue 1-2, 1997, Pages 211-214

Calorimetric determination of NiAl3-growth kinetics in sputter-deposited Ni/Al diffusion couples

Author keywords

Diffusion; Growth kinetics; Ni Al multilayers

Indexed keywords

ACTIVATION ENERGY; DIFFERENTIAL SCANNING CALORIMETRY; DIFFUSION IN SOLIDS; GROWTH KINETICS; INTERMETALLICS; METALLIC FILMS; METALLIC SUPERLATTICES; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

EID: 0031176722     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(97)00014-5     Document Type: Article
Times cited : (27)

References (24)
  • 20
    • 30244452052 scopus 로고    scopus 로고
    • note
    • Neglecting volume changes, the thickness of the trialuminide can be simply found by dividing the periodicity by two, since the molar ratio of Ni and Al in our multilayers is that of the trialuminide and there are two reacting interfaces per period.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.