-
1
-
-
0029204406
-
Groove depth uniformization in (110) Si anisotropic etching by ultrasonic wave and application to accelerometer fabrication
-
K. Ohwada, Y. Negoro, Y. Konaka and T. Oguchi, Groove depth uniformization in (110) Si anisotropic etching by ultrasonic wave and application to accelerometer fabrication, Proc. IEEE MEMS Workshop (MEMS '95), Amsterdam, The Netherlands, 1995, pp. 100-105.
-
Proc. IEEE MEMS Workshop (MEMS '95), Amsterdam, The Netherlands, 1995
, pp. 100-105
-
-
Ohwada, K.1
Negoro, Y.2
Konaka, Y.3
Oguchi, T.4
-
2
-
-
0029288648
-
Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micromachining applications
-
M. Kirsten, B. Wenk, F. Ericson, J.A. Schweitz, W. Riethmüller and P. Lange, Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micromachining applications, Thin Solid Films, 259 (1995) 181-187.
-
(1995)
Thin Solid Films
, vol.259
, pp. 181-187
-
-
Kirsten, M.1
Wenk, B.2
Ericson, F.3
Schweitz, J.A.4
Riethmüller, W.5
Lange, P.6
-
3
-
-
0029488118
-
Novel process for a monolithic integrated accelerometer
-
M. Offenberg, F. Lärmer, B. Elsner, H. Münzel and W. Riethmüller, Novel process for a monolithic integrated accelerometer, Tech. Digest, 8th Int. Conf. Solid-State Sensors and Actuators (Transducers '95/ Eurosensors IX), Stockholm, Sweden, 25-29 June, 1995, Vol. 1, pp. 589-592.
-
(1995)
Tech. Digest, 8th Int. Conf. Solid-State Sensors and Actuators (Transducers '95/ Eurosensors IX), Stockholm, Sweden, 25-29 June
, vol.1
, pp. 589-592
-
-
Offenberg, M.1
Lärmer, F.2
Elsner, B.3
Münzel, H.4
Riethmüller, W.5
-
4
-
-
0029521568
-
Thick polycrystalline silicon for surface micromechanical applications: Deposition, structuring and mechanical characterization
-
P. Lange, M Kirsten, W. Riethmüller, B. Wenk, G. Zwicker, J.R. Morrante, F. Ericson and J.A. Schweitz, Thick polycrystalline silicon for surface micromechanical applications: deposition, structuring and mechanical characterization, Tech. Digest, 8th Int. Conf. Solid-State Sensors and Actuators (Transducers '95/Eurosenson IX), Stockhohn, Sweden, 25-29 June, 1995, Vol. 1, pp. 202-205.
-
(1995)
Tech. Digest, 8th Int. Conf. Solid-State Sensors and Actuators (Transducers '95/Eurosenson IX), Stockhohn, Sweden, 25-29 June
, vol.1
, pp. 202-205
-
-
Lange, P.1
Kirsten, M.2
Riethmüller, W.3
Wenk, B.4
Zwicker, G.5
Morrante, J.R.6
Ericson, F.7
Schweitz, J.A.8
-
5
-
-
84920715058
-
Surface micromachined accelerometer with increased working capacitance and force feedback operation
-
H.C. de Graaff and H. van Kranenburg (eds.), Editions Frontieres
-
B. Wenk, J. Ramos-Martos, M. Fehrenbach, P. Lange, M. Offenberg and W. Riethmüller, Surface micromachined accelerometer with increased working capacitance and force feedback operation, in H.C. de Graaff and H. van Kranenburg (eds.), Proc. ESSDERC '95, The Hague, The Netherlands, 1995, Editions Frontieres, pp. 243-346.
-
Proc. ESSDERC '95, The Hague, The Netherlands, 1995
, pp. 243-346
-
-
Wenk, B.1
Ramos-Martos, J.2
Fehrenbach, M.3
Lange, P.4
Offenberg, M.5
Riethmüller, W.6
-
6
-
-
0030244812
-
The development of a low-stress polysilicon process compatible with standard device processing
-
P.J. French, B.P. van Drieënhuizen, D. Poenar, J.F.L. Goossen, R. Mallée, P.M. Sarro and R.F. Wolffenbuttel, The development of a low-stress polysilicon process compatible with standard device processing, IEEE J. Microelectromech, Syst., 5, (1996) 187-196.
-
(1996)
IEEE J. Microelectromech, Syst.
, vol.5
, pp. 187-196
-
-
French, P.J.1
Van Drieënhuizen, B.P.2
Poenar, D.3
Goossen, J.F.L.4
Mallée, R.5
Sarro, P.M.6
Wolffenbuttel, R.F.7
-
7
-
-
0027614677
-
Comparison of techniques to measure both compressive and tensile stress in thin films
-
B.P. van Drieënhuizen, J.F.L. Goossen, P.J. French and R.F. Wolffenbuttel, Comparison of techniques to measure both compressive and tensile stress in thin films, Sensors and Actuators A, 37-38 (1993) 756-765.
-
(1993)
Sensors and Actuators A
, vol.37-38
, pp. 756-765
-
-
Van Drieënhuizen, B.P.1
Goossen, J.F.L.2
French, P.J.3
Wolffenbuttel, R.F.4
-
8
-
-
0027306533
-
A passive, in situ micro strain gauge
-
L. Lin, R.T. Howe and A.P. Pisano, A passive, in situ micro strain gauge, Proc. IEEE MEMS Workshop (MEMS '93), Fort Lauderdale, FL, USA, 1993, pp. 201-206.
-
Proc. IEEE MEMS Workshop (MEMS '93), Fort Lauderdale, FL, USA, 1993
, pp. 201-206
-
-
Lin, L.1
Howe, R.T.2
Pisano, A.P.3
-
9
-
-
0025840974
-
Polysilicon microstructutes
-
M.M. Farooqui and A.G.R. Evans, Polysilicon microstructutes, Proc. IEEE MEMS Workshop, Nara, Japan, 1991, pp. 187-191.
-
Proc. IEEE MEMS Workshop, Nara, Japan, 1991
, pp. 187-191
-
-
Farooqui, M.M.1
Evans, A.G.R.2
-
10
-
-
0029519828
-
Automatic etch stop on buried oxide using epitaxial lateral overgrowth
-
P.T.J. Gennissen, M. Bartek, P.J. French, P.M. Sarro and R.F. Wolffenbuttel, Automatic etch stop on buried oxide using epitaxial lateral overgrowth, Tech. Digest, 8th Int. Conf. Solid-State Sensors and Actuators (Transducers '95/Eurosensors IX), 25-29 June, 1995, Stockholm, Sweden, pp. 75-78.
-
Tech. Digest, 8th Int. Conf. Solid-State Sensors and Actuators (Transducers '95/Eurosensors IX), 25-29 June, 1995, Stockholm, Sweden
, pp. 75-78
-
-
Gennissen, P.T.J.1
Bartek, M.2
French, P.J.3
Sarro, P.M.4
Wolffenbuttel, R.F.5
-
11
-
-
0028529149
-
Electrostatically driven vacuum encapsulated polysilicon miroresonators part I. Design and fabrication
-
R. Legtenberg and H.C. Tilmans, Electrostatically driven vacuum encapsulated polysilicon miroresonators Part I. Design and fabrication, Sensors and Actuators A, 45 (1994) 57-66.
-
(1994)
Sensors and Actuators A
, vol.45
, pp. 57-66
-
-
Legtenberg, R.1
Tilmans, H.C.2
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